High temperature deformation and threshold behavior in thin films restrained by substrates.
نویسندگان
چکیده
منابع مشابه
In situ deformation of thin films on substrates.
Metallic thin-film plasticity has been widely studied by using the difference between the coefficients of thermal expansion of the film and the underlying substrate to induce stress. This approach is commonly known as the wafer curvature technique, based on the Stoney equation, which has shown that thinner films have higher yield stresses. The linear increase of the film strength as a function ...
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ژورنال
عنوان ژورنال: Materia Japan
سال: 2000
ISSN: 1340-2625,1884-5843
DOI: 10.2320/materia.39.438